The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2018

Filed:

Oct. 06, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Sang-hyun Park, Hwaseong-si, KR;

Jae-hak Lee, Yongin-si, KR;

Bo-hyeok Choi, Yongin-si, KR;

Sang-kyun Kim, Hwaseong-si, KR;

Won-ki Hur, Suwon-si, KR;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-Do, KR;

K.C. TECH CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C09G 1/02 (2006.01); H01L 21/02 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); C09G 1/02 (2013.01); H01L 21/02532 (2013.01); H01L 21/3081 (2013.01); H01L 21/3085 (2013.01);
Abstract

A method of fabricating an integrated circuit device may include forming a polishing stop layer and a semiconductor layer on a substrate, and selectively polishing the semiconductor layer from a surface which simultaneously exposes the polishing stop layer and the semiconductor layer, by using a slurry composition including a compound composition and polishing particles. The compound composition may include a sulfonate compound and a terminal amine group-including compound.


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