The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Sep. 23, 2016
Nuflare Technology, Inc., Yokohama-shi, JP;
Hirofumi Morita, Setagaya-ku, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
Abstract
In one embodiment, a multi charged particle beam writing method includes performing blanking deflection on each of multiple beams using a plurality of individual blankers, and collectively performing blanking deflection on the multiple beams using a common blanker. The beams controlled in the beam ON state by the individual blankers and the common blanker pass through a hole at central part of a liming aperture member. The beams deflected in the beam OFF state by the individual blankers or the common blanker are deviated from the hole and are interrupted by the limiting aperture member. When one of the common blanker and the individual blanker deflects one of the beams to the beam OFF state while the other of them deflects the beam in the beam OFF state, the beam moves on the limiting aperture member such that the beam is away from the hole.