The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Dec. 12, 2014
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Dieter Weber, Rossdorf, DE;
Markus Waiblinger, Darmstadt, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/40 (2017.01); H01J 37/26 (2006.01); G06T 7/00 (2017.01); G06T 11/60 (2006.01); G02B 21/00 (2006.01); G01Q 30/02 (2010.01); G01Q 30/04 (2010.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G06T 7/40 (2013.01); G01Q 30/02 (2013.01); G01Q 30/04 (2013.01); G02B 21/008 (2013.01); G06T 7/0008 (2013.01); G06T 11/60 (2013.01); H01J 37/26 (2013.01); G06K 2009/4666 (2013.01); H01J 2237/2583 (2013.01); H01J 2237/2817 (2013.01); H01J 2237/31744 (2013.01);
Abstract
An apparatus for correlating at least two images of a photolithographic mask that at least partially overlap, in which the apparatus includes a correlation unit that is provided to use at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask for the correlation of the at least two images.