The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2018

Filed:

Nov. 22, 2017
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Shih-Yin Hsiao, Chiayi County, TW;

Kuan-Liang Liu, Hsinchu County, TW;

Ching-Chung Yang, Hsinchu, TW;

Kai-Kuen Chang, Keelung, TW;

Ping-Hung Chiang, Hsinchu, TW;

Nien-Chung Li, Hsinchu, TW;

Wen-Fang Lee, Hsinchu, TW;

Chih-Chung Wang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7823 (2013.01); H01L 21/033 (2013.01); H01L 29/0619 (2013.01); H01L 29/0653 (2013.01); H01L 29/1095 (2013.01); H01L 29/4238 (2013.01); H01L 29/66545 (2013.01); H01L 29/66681 (2013.01);
Abstract

A high-voltage MOS transistor includes a semiconductor substrate, a gate oxide layer on the semiconductor substrate, a gate on the gate oxide layer, a spacer covering a sidewall of the gate, a source on one side of the gate, and a drain on the other side of the gate. The gate includes at least a first discrete segment and a second discrete segment. The first discrete segment is not in direct contact with the second discrete segment. The spacer fills into a gap between the first discrete segment and the second discrete segment.


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