The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2018

Filed:

Jun. 30, 2016
Applicants:

International Business Machines Corporation, Armonk, NY (US);

Ulvac, Inc., Chigasaki, Kanagawa, JP;

Inventors:

Takashi Ando, Tuckhoe, NY (US);

Vijay Narayanan, New York, NY (US);

Yohei Ogawa, White Plains, NY (US);

John Rozen, Hastings on Hudson, NY (US);

Assignees:

INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);

ULVAC, INC., Chigasaki, Kanagawa, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02304 (2013.01); H01L 21/0234 (2013.01); H01L 21/02178 (2013.01); H01L 21/02181 (2013.01); H01L 21/02192 (2013.01); H01L 21/02205 (2013.01); H01L 21/02274 (2013.01); H01L 21/02334 (2013.01);
Abstract

A technique relates to in-situ cleaning of a high-mobility substrate. Alternating pulses of a metal precursor and exposure to a plasma of a gas or gas mixture are applied. The gas or gas mixture contains both nitrogen and hydrogen (e.g., NH). A passivation layer is formed on the high-mobility substrate by alternating pulses of the metal precursor and exposure to the plasma of a gas, or gas mixture, containing both nitrogen and hydrogen.


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