The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Apr. 24, 2015
Asml Netherlands B.v., Veldhoven, NL;
Christianus Wilhelmus Johannes Berendsen, Roermond, NL;
Marcel Beckers, Waalre, NL;
Henricus Jozef Castelijns, Bladel, NL;
Hubertus Antonius Geraets, Arendonk, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Leon Martin Levasier, Hedel, NL;
Peter Schaap, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Siegfried Alexander Tromp, Papendrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.