The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Nov. 09, 2011
Jon Mcchesney, Sacramento, CA (US);
Saravanapriyan Sriraman, Fremont, CA (US);
Ricky Marsh, San Ramon, CA (US);
Alex Paterson, San Jose, CA (US);
John Holland, San Jose, CA (US);
Jon McChesney, Sacramento, CA (US);
Saravanapriyan Sriraman, Fremont, CA (US);
Ricky Marsh, San Ramon, CA (US);
Alex Paterson, San Jose, CA (US);
John Holland, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-HO and can provide at least about 30 cfm of air.