The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Dec. 22, 2016
Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, CN;
Xiaoliang Jin, Shanghai, CN;
Chunyu Yuan, Shanghai, CN;
Abstract
A sampling method and apparatus applied to optical proximity correction of a lithography layout are provided in the present disclosure. The sampling method includes: performing wavelet decomposition to a pattern in the layout to be corrected, to acquire wavelet matrixes of different orders; and performing wavelet reconstruction according to the wavelet matrixes of the different orders for discrete sampling, wherein results of the discrete sampling are applied to simulation in the OPC. The sampling method and apparatus can improve the accuracy and efficiency of sampling of the layout to be corrected in a conventional technology.