The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Jun. 06, 2016
Applicant:
Mentor Graphics Corporation, Wilsonville, OR (US);
Inventor:
Juan Andres Torres Robles, Wilsonville, OR (US);
Assignee:
Mentor Graphics Corporation, Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5022 (2013.01); G06F 17/5036 (2013.01); G03F 1/36 (2013.01); G06F 2217/06 (2013.01); G06F 2217/10 (2013.01); G06F 2217/12 (2013.01); G06F 2217/84 (2013.01); Y02T 10/82 (2013.01);
Abstract
A system for analyzing IC layouts and designs by calculating variations of a number of objects to be created on a semiconductor wafer as a result of different process conditions. The variations are analyzed to determine individual feature failures or to rank layout designs by their susceptibility to process variations. In one embodiment, the variations are represented by PV-bands having an inner edge that defines the smallest area in which an object will always print and an outer edge that defines the largest area in which an object will print under some process conditions.