The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2018

Filed:

Dec. 12, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventor:

Boris Golovanevsky, Haifa, IL;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/95 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); H01L 21/68764 (2013.01); G01N 2201/02 (2013.01); Y10T 29/49 (2015.01);
Abstract

Metrology tool stage configurations and respective methods are provided, which comprise a pivoted connection arranged to receive a wafer and enable rotation thereof about a pivot; a radial axis arranged to radially move the rotatable pivoted connection attached thereto; and optics having a stationary part configured to generate a collimated illumination beam. For example, the optics may be stationary and the radial axis may be centrally rotated to enable stage operation without requiring additional space for guiding systems. In another example, a part of the optics may be rotatable, when configured to receive illumination via a mechanically decoupled or empty region, receive power and control wirelessly and deliver data wirelessly. The disclosed configurations provide more compact and more robust stages which efficiently handle large wafers. Stage configurations may be horizontal or vertical, the latter further minimizing the tool's footprint.


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