The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Feb. 22, 2016
Applicant:

University of South Carolina, Columbia, SC (US);

Inventors:

MVS Chandrashekhar, Columbia, SC (US);

Tangali S. Sudarshan, Columbia, SC (US);

Sabih U. Omar, West Columbia, SC (US);

Gabriel Brown, Lexington, SC (US);

Shamaita S. Shetu, West Columbia, SC (US);

Assignee:

University of South Carolina, Columbia, SC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/095 (2006.01); H01L 31/11 (2006.01); H01L 31/028 (2006.01); H01L 31/0224 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1105 (2013.01); H01L 31/028 (2013.01); H01L 31/022408 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01);
Abstract

A bi-polar device is provided, along with methods of making the same. The bi-polar device can include a semiconductor substrate doped with a first dopant, a semiconductor layer on the first surface of the semiconductor substrate, and a Schottky barrier layer on the semiconductor layer. The method of forming a bi-polar device can include: forming a semiconductor layer on a first surface of a semiconductor substrate, where the semiconductor substrate comprises a first dopant and where the semiconductor layer comprises a second dopant that has an opposite polarity than the first dopant; and forming a Schottky barrier layer on a first portion of the semiconductor layer while leaving a second portion of the semiconductor layer exposed.


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