The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Oct. 30, 2014
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Manfred Maul, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 17/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); G02B 17/002 (2013.01); G02B 26/0816 (2013.01); G03F 7/702 (2013.01); G03F 7/70075 (2013.01); G03F 7/70091 (2013.01); G03F 7/70116 (2013.01); G03F 7/70191 (2013.01); G03F 7/70566 (2013.01);
Abstract

An illumination optical unit for projection lithography illuminates an object field with illumination light. The illumination optical unit has a collector for collecting the emission of a light source for the illumination light. The collector is arranged such that it transfers the illumination light from the light source into an intermediate focus. The illumination optical unit furthermore has a field facet mirror and a pupil facet mirror, each having a plurality of facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has an individual-mirror array having individual mirrors tiltable in a manner driven individually. The array is arranged upstream of the field facet mirror and downstream of the intermediate focus in an illumination beam path.


Find Patent Forward Citations

Loading…