The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Apr. 29, 2016
Applicant:

Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa, JP;

Inventors:

Jun Matsushita, Yokohama, JP;

Takashi Miyamoto, Yokohama, JP;

Konosuke Hayashi, Yokohama, JP;

Osamu Yamazaki, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 3/30 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F26B 3/30 (2013.01); H01L 21/67115 (2013.01);
Abstract

The substrate processing unitcomprises the rotating tableconfigured to hold substrate W, the processing chamberwhich accommodates the rotating table, a lampis provided above the processing chamberand configured to heat the surface of substrate W, the lamp chamberwhich accommodates that lamp, a transmission windowdisposed below the lamp chamber, and a plurality of nozzlewhich supply cooling fluid G to the transmission window. Then the substrate processing unitcan suppress generating of a water mark or pattern collapse, and can perform good substrate processing.


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