The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Sep. 27, 2016
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Hao-Yu Chen, Kaohsiung, TW;
Chang-Yun Chang, Taipei, TW;
Cheng-Chuan Huang, Taipei County, TW;
Fu-Liang Yang, Hsin-Chu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsin-Chu, TW;
Abstract
FinFET devices, along with methods for fabricating such devices, are disclosed herein for facilitating device characterization. An exemplary FinFET device includes a fin having a first portion extending in a first direction and a second portion extending from the first portion in a second direction. The second direction is substantially perpendicular to the first direction. The first portion includes a first region doped with a first type dopant disposed between second regions doped with a second type dopant. The first type dopant is opposite the second type dopant. A source contact and a drain contact are coupled to the second regions of the first portion, and a body contact is coupled to the second portion. A gate is disposed over the first region of the first portion, and the second portion extends from the first region.