The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Feb. 01, 2017
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Hiroshi Yanagigawa, Hitachinaka, JP;

Hiroyoshi Kudou, Hitachinaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/10 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 21/26513 (2013.01); H01L 29/1095 (2013.01); H01L 29/4236 (2013.01); H01L 29/66712 (2013.01);
Abstract

A semiconductor device according to one embodiment includes a semiconductor substrate having a main surface and a back surface opposite to the main surface, a drift region of a first conductivity type, a base region of a second conductivity type, a source region of the first conductivity type, and a gate electrode. The semiconductor substrate has a trench in the main surface. The gate electrode is formed in the trench. A distribution of an impurity concentration in the base region has a plurality of peak values along a direction of depth from the main surface toward the back surface, and the number of peak values is four or more.


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