The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Aug. 17, 2010
Applicants:
Deyan Wang, Hudson, MA (US);
Peter Trefonas, Iii, Medway, MA (US);
Michael K. Gallagher, Hopkinton, MA (US);
Inventors:
Deyan Wang, Hudson, MA (US);
Peter Trefonas, III, Medway, MA (US);
Michael K. Gallagher, Hopkinton, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/0392 (2013.01); G03F 7/2041 (2013.01);
Abstract
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.