The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Dec. 21, 2015
Industrial Technology Research Institute, Hsinchu, TW;
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Abstract
An apparatus and a method for dual mode depth measurement are provided. The apparatus is used for measuring a depth information of a specular surface in a depth from defocus (DFD) mode or measuring a depth information of a textured surface in a depth from focus (DFF) mode. The apparatus includes a light source, a controller, a processor, a lighting optical system, an imaging optical system, a beam splitter and a camera. The controller is for switching between the depth from defocus mode and the depth from focus mode. The lighting optical system is used to focus a light from the light source on an object surface in the depth from defocus mode, and the lighting optical system is used to illuminate the object surface with a uniform irradiance in the depth from focus mode.