The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Oct. 06, 2014
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Aurélien Philippe Jean Maclou Botman, Portland, OR (US);
Steven Randolph, Portland, OR (US);
Milos Toth, Sydney, AU;
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/10 (2006.01); C23C 16/14 (2006.01); C23C 16/48 (2006.01); C23C 16/448 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/0263 (2013.01); C23C 16/10 (2013.01); C23C 16/14 (2013.01); C23C 16/4488 (2013.01); C23C 16/48 (2013.01); C23C 16/486 (2013.01); C23C 16/52 (2013.01);
Abstract
Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.