The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Oct. 05, 2012
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Aniruddha Pal, Santa Clara, CA (US);

Martin Jeffrey Salinas, San Jose, CA (US);

Dmitry Lubomirsky, Cupertino, CA (US);

Imad Yousif, San Jose, CA (US);

Andrew Nguyen, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/50 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67103 (2013.01); C23C 16/4585 (2013.01);
Abstract

Apparatus for processing semiconductors are provided herein. In some embodiments, an apparatus for processing a substrate may include: a first ring disposed concentrically about a substrate support, the first ring configured to position a substrate atop the substrate support during processing; and a second ring disposed between the substrate support and the first ring, the second ring configured to provide a heat transfer path from the first ring to the substrate support.


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