The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Jun. 13, 2016
Carl Zeiss Microscopy Gmbh, Jena, DE;
Klaus Hegele, Aalen, DE;
Edgar Fichter, Unterkochen, DE;
Michel Aliman, Oberkochen, DE;
Dirk Preikszas, Oberkochen, DE;
Christian Hendrich, Westhausen, DE;
Momme Mommsen, Oberkochen, DE;
Michael Schnell, Rechberghausen, DE;
Kai Schubert, Oberkochen, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.