The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Dec. 06, 2016
Microvision, Inc., Redmond, WA (US);
Jason B. Tauscher, Sammamish, WA (US);
Wyatt O. Davis, Bothell, WA (US);
Dean R. Brown, Lynwood, WA (US);
Mark P. Helsel, Seattle, WA (US);
Quinn William Haynie, Redmond, WA (US);
Matthieu Saracco, Redmond, WA (US);
Microvision, Inc., Redmond, WA (US);
Abstract
The embodiments described herein provide microelectromechanical system (MEMS) scanners with increased resistance to distortion in the mirror surface. Such MEMS scanners, when incorporated into laser scanning devices, are used to reflect laser light into a pattern of scan lines. Thus, by reducing distortion in the scanning surface these MEMS scanners can provide improved performance in scanning laser devices, including scanning laser projectors and laser depth scanners. In general, this is accomplished by providing a MEMS scanner where the connection to the scan plate is made at an intermediate support structure, and at a point on that intermediate support structure that is offset from the scanning surface. Providing the connection to the scan plate at points offset from the scanning surface can reduce the distortion that occurs in the scanning surface as a result of rotational forces in the MEMS scanner.