The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Jan. 30, 2014
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Takanori Aono, Tokyo, JP;
Yoshisada Ebata, Tokyo, JP;
Shigeru Matsui, Tokyo, JP;
Tetsuya Watanabe, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A technique is provided which enables preparation of a curved grating having a desired curvature, by plastically deforming, along a curved substrate, a flat grating prepared by a semiconductor process on a silicon substrate, and which thus prepares a diffraction grating with high accuracy. A silicon flat grating prepared by a semiconductor process is transferred to an amorphous material, and the amorphous material substrate is curved and mounted on a curved fixed substrate, thus providing a curved grating having a crystalline material in which the generation of a dislocation line is restrained.