The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Sep. 03, 2012
Applicants:

Fabrice Coustier, Chambéry, FR;

Denis Camel, Chambéry, FR;

Anis Jouini, Chambéry, FR;

Etienne Pihan, La Motte Servolex, FR;

Inventors:

Fabrice Coustier, Chambéry, FR;

Denis Camel, Chambéry, FR;

Anis Jouini, Chambéry, FR;

Etienne Pihan, La Motte Servolex, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 11/00 (2006.01); C30B 11/14 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
C30B 11/003 (2013.01); C30B 11/00 (2013.01); C30B 11/002 (2013.01); C30B 11/14 (2013.01); C30B 29/06 (2013.01); Y10T 117/1092 (2015.01);
Abstract

The device forming a crucible for fabrication of crystalline material by directional solidification comprises a bottom and at least one side wall. The bottom presents a first portion having a first thermal resistance and a second portion having a second thermal resistance that is lower than the first thermal resistance. The second portion is designed to receive a seed for fabrication of the crystalline material. The bottom and side wall are at least partially formed by a tightly sealed part including at least one indentation participating in defining said first and second portions. The first portion is covered by a first anti-adherent layer having an additional first thermal resistance. The second portion may be covered by a second anti-adherent layer having an additional second thermal resistance that is lower than the first thermal resistance.


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