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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9941114 B1

PDFFull Text
Date of Patent:
Apr. 10, 2018

Filed:

Feb. 02, 2015

Organometallic precursors and methods of forming thin layers using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Inventors:

Youn-Joung Cho, Hwaseong-si, KR;

Youn-Soo Kim, Yongin-si, KR;

Sang-Jun Yim, Cheongju-si, KR;

Myong-Woon Kim, Daejeon, KR;

Sang-Ick Lee, Daejeon, KR;

Sang-Chul Youn, Suwon-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Kamal Saeed

Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 23/00 (2006.01); C07F 7/00 (2006.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C07F 7/006 (2013.01); C23C 16/405 (2013.01); C23C 16/45553 (2013.01); H01L 21/02189 (2013.01); H01L 23/291 (2013.01); H01L 23/3171 (2013.01); H01L 28/40 (2013.01); H01L 2924/0002 (2013.01);
Abstract

An organometallic precursor is represented by a chemical formula of Xn(M)(R1)m(R2)k. M is a central metal. X is a ligand of M and one of 6,6-dimethylfulvenyl, indenyl, cyclopentadienyl and cyclopentadienyl substituted with an amino group. R1 and R2 are ligands of M, and each independently an amino group or an ethylenediamino group. Each n, m and k is a positive integer, and a sum of n, m and k is equal to 3 or 4.

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Quick Actions:

Cho, Youn-Joung. (2018). Organometallic precursors and methods of forming thin layers using the same (U.S. Patent No. 9941114). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9941114

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