The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Dec. 16, 2015
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Alain F. Loiseau, Williston, VT (US);
Joseph M. Lukaitis, Pleasant Valley, NY (US);
Ephrem G. Gebreselasie, South Burlington, VT (US);
Richard A. Poro, Bristol, VT (US);
Andreas D. Stricker, Essex Junction, VT (US);
Ahmed Y. Ginawi, South Burlington, VT (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H02H 9/04 (2006.01); G11C 7/24 (2006.01); H01L 23/525 (2006.01); H01L 27/02 (2006.01); H01L 27/06 (2006.01); H01L 27/112 (2006.01); G11C 5/00 (2006.01); G11C 17/16 (2006.01);
U.S. Cl.
CPC ...
G11C 7/24 (2013.01); G11C 5/005 (2013.01); G11C 17/16 (2013.01); H01L 23/5256 (2013.01); H01L 27/0255 (2013.01); H01L 27/0266 (2013.01); H01L 27/0617 (2013.01); H01L 27/11206 (2013.01);
Abstract
The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) protection structures for eFuses. The structure includes an electrostatic discharge (ESD) protection structure operatively coupled to an eFuse, which is structured to prevent unintentional programming of the eFuse due to an ESD event originating at a source.