The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
May. 22, 2015
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
Artak Isoyan, Beaverton, OR (US);
Lawrence S. Melvin, III, Hillsboro, OR (US);
Assignee:
Synopsys, Inc., Mountain View, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 3/40 (2006.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06T 3/40 (2013.01); G03F 1/36 (2013.01); G03F 7/70441 (2013.01);
Abstract
Systems and techniques for performing resolution enhancement on target patterns based on holographic imaging technique (HIT) are described. During operation, an electronic design automation (EDA) tool can compute an in-line hologram of the target patterns based on parameters associated with a photolithography process that is used in a semiconductor manufacturing process, wherein the semiconductor manufacturing process is to be used for printing the target patterns on a semiconductor wafer. Next, the EDA tool can determine the mask patterns based on the in-line hologram.