The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Jan. 29, 2013
Michael Matthew M. Crouse, Albany, NY (US);
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Peng Liu, Sunnyvale, CA (US);
Hua-yu Liu, Palo Alto, CA (US);
Aiqin Jiang, Guilderland, NY (US);
Wenjin Huang, San Jose, CA (US);
Michael Matthew M. Crouse, Albany, NY (US);
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Peng Liu, Sunnyvale, CA (US);
Hua-Yu Liu, Palo Alto, CA (US);
Aiqin Jiang, Guilderland, NY (US);
Wenjin Huang, San Jose, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.