The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Sep. 12, 2012
Applicant:

Jerry Johannes Martinus Peijster, Houten, NL;

Inventor:
Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/16 (2006.01); H01J 37/18 (2006.01); H01J 37/24 (2006.01); G03F 7/20 (2006.01); H01L 21/67 (2006.01); H01J 37/317 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G01N 21/88 (2006.01); H01J 37/20 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2014 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G01N 21/88 (2013.01); G03F 7/7085 (2013.01); G03F 7/70841 (2013.01); H01J 37/16 (2013.01); H01J 37/18 (2013.01); H01J 37/20 (2013.01); H01J 37/24 (2013.01); H01J 37/261 (2013.01); H01J 37/3174 (2013.01); H01J 37/3177 (2013.01); H01L 21/6719 (2013.01); G01N 2201/022 (2013.01); H01J 2237/28 (2013.01);
Abstract

A target processing machine (), such as a lithography or inspection machine, comprising a rigid base plate (), a projection column () for projecting one or more optical or particle beams on to a target (), a support frame () supporting the projection column, the support frame being supported by and fixed to the base plate, a stage comprising a movable part () for carrying the target and a fixed part () being supported by and fixed to the base plate, a beam sensor () for detecting one or more of the beams projected by the column, the beam sensor at least in part being supported by and fixed to the base plate, and a vacuum chamber () enclosing the support frame and the column, for maintaining a vacuum environment in the interior space of the chamber, the vacuum chamber formed with the base plate forming part thereof, and supporting a plurality of wall panels () including a plurality of side wall panels () supported by and fixed thereto.


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