The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Nov. 04, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Maxim Pisarenco, Veldhoven, NL;
Irwan Dani Setija, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01B 11/02 (2013.01); G03F 7/705 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01);
Abstract
In scatterometry, a merit function including a regularization parameter is used in an iterative process to find values for the scattering properties of the measured target. An optimal value for the regularization parameter is obtained for each measurement target and in each iteration of the iterative process. Various methods can be used to find the value for the regularization parameter, including the Discrepancy Principle, the chi-squared method and novel modifications of the Discrepancy Principle and the chi-squared method including a merit function.