The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Nov. 04, 2014
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken, JP;

Inventors:

Seiji Yasumoto, Tochigi, JP;

Masataka Sato, Tochigi, JP;

Tomoya Aoyama, Kanagawa, JP;

Ryu Komatsu, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 38/10 (2006.01); B32B 43/00 (2006.01); H01L 51/00 (2006.01); H01L 21/687 (2006.01); H01L 51/52 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
B32B 43/006 (2013.01); H01L 51/003 (2013.01); B32B 38/10 (2013.01); B32B 2309/105 (2013.01); B32B 2315/08 (2013.01); B32B 2457/00 (2013.01); H01L 21/68757 (2013.01); H01L 27/3244 (2013.01); H01L 51/0097 (2013.01); H01L 51/5237 (2013.01); H01L 51/5262 (2013.01); H01L 2221/68386 (2013.01); H01L 2251/5338 (2013.01); Y10T 156/11 (2015.01); Y10T 156/1142 (2015.01); Y10T 156/1168 (2015.01); Y10T 156/1184 (2015.01); Y10T 156/1967 (2015.01); Y10T 156/1978 (2015.01);
Abstract

The yield of a peeling process is improved. A first step of forming a peeling layer to a thickness of greater than or equal to 0.1 nm and less than 10 nm over a substrate; a second step of forming, on the peeling layer, a layer to be peeled including a first layer in contact with the peeling layer; a third step of separating parts of the peeling layer and parts of the first layer to form a peeling trigger; and a fourth step of separating the peeling layer and the layer to be peeled are performed. The use of the thin peeling layer can improve the yield of a peeling process regardless of the structure of the layer to be peeled.


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