The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Sep. 29, 2015
Nanoscribe Gmbh, Eggenstein-Leopoldshafen, DE;
Michael Thiel, Karlsruhe, DE;
Roman Reinhard Reiner, Karlsruhe, DE;
Fabian Niesler, Karlsruhe, DE;
Yann Tanguy, Linkenheim-Hochstetten, DE;
Nanoscribe GmbH, Eggenstein-Leopoldshafen, DE;
Abstract
A method for producing a three-dimensional structure () in a lithographic material () that can be polymerized and thus solidified using energy input methods, wherein initially a shell wall () of the three-dimensional structure () to be produced is polymerized so as to form a polymerized shell wall () such that a volume () of unpolymerized lithographic material is enclosed using a first, spatially resolving energy input method, wherein the lithographic material () surrounding the polymerized shell wall () is removed in an intermediate development step, wherein subsequently the volume () enclosed by the shell wall () is polymerized using a second energy input method.