The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Dec. 22, 2015
Applicant:
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Inventors:
Stefan Landis, Tullins, FR;
Nicolas Posseme, Sassenage, FR;
Sebastien Barnola, Villard-Bonnot, FR;
Thibaut David, Goncelin, FR;
Lamia Nouri, Grenoble, FR;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/266 (2006.01); C23C 14/48 (2006.01); C23C 14/04 (2006.01); H01L 21/3065 (2006.01); H01L 21/306 (2006.01); B81C 1/00 (2006.01); H01L 33/00 (2010.01); H01L 33/22 (2010.01); H01L 31/18 (2006.01); H01L 31/0392 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/266 (2013.01); C23C 14/042 (2013.01); C23C 14/48 (2013.01); H01L 21/3065 (2013.01); H01L 21/30604 (2013.01); B81C 1/0046 (2013.01); G03F 7/0002 (2013.01); H01L 31/0392 (2013.01); H01L 31/1852 (2013.01); H01L 33/007 (2013.01); H01L 33/22 (2013.01);
Abstract
The invention relates in particular to a method for producing subsequent patterns in an underlying layer (), the method comprising at least one step of producing prior patterns in a carbon imprintable layer () on top of the underlying layer (), the production of the prior patterns involving nanoimprinting of the imprintable layer () and leave in place a continuous layer formed by the imprintable layer () and covering the underlying layer (), characterized in that it comprises the following step: