The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Mar. 25, 2014
Applicant:
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/04 (2006.01); H01J 37/28 (2006.01); H01J 37/22 (2006.01); G01N 23/225 (2018.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01N 23/2255 (2013.01); H01J 37/222 (2013.01); G01N 2223/045 (2013.01); H01J 2237/226 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/2804 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2807 (2013.01);
Abstract
A focused ion beam apparatus includes a focused ion beam irradiation mechanism that forms first and second cross-sections in a sample. A first image generation unit generates respective first images, either reflected electron images or secondary electron images, of the first and second cross-sections, and a second image generation unit generates a second image that is an EDS image of the first cross-section. A control section generates a three-dimensional image of a specific composition present in the sample based on the first images and the second image.