The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Apr. 03, 2014
Hitachi High-technologies Corporation, Tokyo, JP;
Hiroyuki Takayama, Tokyo, JP;
Kazuhiro Nakamura, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A rinse mechanism rinses reaction cuvettes with first and second detergents. An R1 reagent pipetting mechanismrinses the reaction cuvettes that have been rinsed by the rinse mechanism with a special detergent. A counting unit counts and stores in a storage unit a use frequency of each reaction cuvette for a specific reagent item. A determining unit determines whether the counted use frequency exceeds a predetermined threshold N1. A control unit controls the R1 reagent pipetting mechanism such that, in a case where the counted use frequency exceeds the predetermined threshold N1, the reaction cuvettes, which have exceeded the predetermined threshold N1, are soaked with the special detergent only for a period equal to or less than a value derived by multiplying a pipetting cycle time, which indicates a period when a sample is pipetted, by the total number of reaction cuvettes and a predetermined integer.