The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
Feb. 09, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Keith A. Miller, Mountain View, CA (US);
Thanh X. Nguyen, San Jose, CA (US);
Ilya Lavitsky, San Francisco, CA (US);
Randy Schmieding, Saratoga, CA (US);
Prashanth Kothnur, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3452 (2013.01); C23C 14/345 (2013.01); C23C 14/3485 (2013.01); C23C 14/352 (2013.01); H01J 37/3408 (2013.01); H01J 37/3417 (2013.01); H01J 37/3467 (2013.01);
Abstract
Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.