The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2018

Filed:

Dec. 24, 2014
Applicant:

Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;

Inventors:

Huan Liu, Shenzhen, CN;

Jinjie Wang, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G02F 1/1335 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133516 (2013.01); G02B 5/201 (2013.01); G03F 7/0007 (2013.01); G02F 2001/133519 (2013.01);
Abstract

The present invention discloses a method for manufacturing a color filter, a color filter, and a liquid crystal panel. The method comprises: providing a substrate; and forming a plurality of color resistances on the substrate one by one using a color resistance forming process, with boundaries of adjacent color resistances being overlapped with each other. The color resistance forming process comprises: coating a photoresist material on the substrate to form a color resistance unit thereof; exposing the color resistance unit, with a light intensity received at the boundary of the color resistance unit being smaller than that received by the main body of the color resistance unit. Through the present invention, dark pixel lines at the boundary overlaps can be eliminated, and transmittance of the product can be enhanced.


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