The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2018

Filed:

Feb. 22, 2017
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Martin Endres, Koenigsbronn, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); G03F 7/70033 (2013.01); G03F 7/70075 (2013.01); G03F 7/70091 (2013.01);
Abstract

An illumination optical assembly for projection lithography serves for illuminating an illumination field, in which an object field of a downstream imaging optical assembly is arrangeable, with illumination light of an EUV light source. The illumination optical assembly has a pupil illumination unit, on which the illumination light impinges and which includes facets for illuminating a pupil in the illumination beam path with the illumination light with a predefined pupil intensity distribution. The pupil illumination unit is embodied such that a plurality of illumination channels of the pupil illumination unit illuminate only a part of the entire object field. This results in an illumination optical assembly in which an excessively high illumination intensity on the facets of the pupil illumination unit can be reduced.


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