The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Jun. 23, 2016
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Qiang Wu, Shanghai, CN;
Yuntao Jiang, Shanghai, CN;
Abstract
System and method for measuring an aerial image are provided. The system may include a lighting unit for providing illuminating light to pass through a mask to form initial light. An imaging unit is configured for imaging the initial light to form imaging light. A beam splitting unit is for splitting the imaging light into projection light and reference light. A projection light is projected to a substrate to form a mask image in the substrate, and the substrate reflects the projection light to form first reflected light onto the beam splitting unit. A reflecting unit is for receiving the reference light to form second reflected light, and for projecting the second reflected light onto the beam splitting unit, the second reflected light and the first reflected light interfering with each other to form interference light. A measuring unit is for measuring an aerial image formed from the interference light.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile