The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Jun. 25, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Muhammad M. Rasheed, San Jose, CA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Shih Chung Chen, Cupertino, CA (US);
Kevin A. Papke, Portland, OR (US);
Lei Zhou, Santa Clara, CA (US);
Jing Zhou, Milpitas, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. In some embodiments, a process chamber includes: a chamber body and a lid assembly defining a processing volume within the process chamber; a substrate support disposed within the processing volume to support a substrate; and a showerhead having a first surface including a plurality of gas distribution holes disposed opposite and parallel to the substrate support, wherein the showerhead is fabricated from aluminum and includes an aluminum oxide coating along the first surface, wherein the aluminum oxide coating has a thickness of about 0.0001 to about 0.002 inches. In some embodiments, the showerhead may further have at least one of a roughness of about 10 to about 300 μ-in Ra, or an emissivity (∈) of about 0.20 to about 0.80. The process chamber may be a thermal atomic layer deposition (ALD) chamber.