The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Aug. 17, 2016
Applicant:
Ontos Equipment Systems, Inc., Chester, NH (US);
Inventor:
Eric Frank Schulte, Santa Barbara, CA (US);
Assignee:
Ontos Equipment Systems, Inc., Chester, NH (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 23/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C30B 23/025 (2013.01); H01J 37/32018 (2013.01); H01J 37/32825 (2013.01); H01J 37/32348 (2013.01);
Abstract
After CMP and before an epitaxial growth step, the substrate is prepared by an atmospheric plasma which includes not only a reducing chemistry, but also metastable states of a chemically inert carrier gas. This removes residues, oxides, and/or contaminants. Optionally, nitrogen passivation is also performed under atmospheric conditions, to passivate the substrate surface for later epitaxial growth.