The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Sep. 02, 2014
Applicant:
Pivotal Systems Corporation, Fremont, CA (US);
Inventors:
Adam J. Monkowski, Pleasanton, CA (US);
Jialing Chen, Sunnyvale, CA (US);
Tao Ding, Pleasanton, CA (US);
Joseph R. Monkowski, Danville, CA (US);
Assignee:
PIVOTAL SYSTEMS CORPORATION, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 (2006.01); F16K 7/16 (2006.01); F16K 7/14 (2006.01); F16K 31/00 (2006.01);
U.S. Cl.
CPC ...
G05D 7/0635 (2013.01); F16K 7/14 (2013.01); F16K 7/16 (2013.01); F16K 31/004 (2013.01); F16K 31/006 (2013.01); Y10T 137/0379 (2015.04); Y10T 137/0396 (2015.04); Y10T 137/7737 (2015.04); Y10T 137/7759 (2015.04); Y10T 137/7761 (2015.04); Y10T 137/8158 (2015.04); Y10T 137/8242 (2015.04); Y10T 137/8275 (2015.04);
Abstract
A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.