The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Jan. 06, 2015
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Mitsunori Sugiyama, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/418 (2013.01); G05B 2219/45031 (2013.01); Y02P 90/02 (2015.11);
Abstract

The present invention efficiently executes a plurality of functions of a substrate treatment apparatus. A control deviceincludes: a plurality of software applications (interface-related APSWand control-related APSW) configured to execute each function of treatments concerning a CMP apparatus; and a shared memorywhich stores information that is used in the plurality of software applications therein. The plurality of software applications include a task monitoring software applicationwhich monitors whether abnormality has occurred in the plurality of software applications or not. The task monitoring software applicationrestarts the software application in which the abnormality has occurred, when the abnormality has occurred in any of the plurality of software applications, and makes the other software applications continue the respective processes.


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