The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Aug. 22, 2012
Ivo Adam Johannes Thomas, Son, NL;
Coen Cornelis Wilhelmus Verspaget, Helmond, NL;
Ronald Van Der Ham, Maarheeze, NL;
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
Gerben Pieterse, Eindhoven, NL;
Pieter Lein Joseph Gunter, Weert, NL;
Ivo Adam Johannes Thomas, Son, NL;
Coen Cornelis Wilhelmus Verspaget, Helmond, NL;
Ronald Van Der Ham, Maarheeze, NL;
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
Gerben Pieterse, Eindhoven, NL;
Pieter Lein Joseph Gunter, Weert, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.