The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Apr. 04, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Teppei Adachi, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 1/50 (2012.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01); G03F 1/80 (2012.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); G03F 1/50 (2013.01); G03F 1/80 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/039 (2013.01); G03F 7/09 (2013.01); G03F 7/093 (2013.01); G03F 7/11 (2013.01); G03F 7/2059 (2013.01); G03F 7/322 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01); G03F 7/405 (2013.01);
Abstract
A photomask blank has a chemically amplified negative resist film comprising (A) a polymer comprising recurring units of specific structure and recurring units having fluorine, (B) a base resin adapted to reduce its solubility in alkaline developer under the action of acid, (C) an acid generator, and (D) a basic compound. The resist film is improved in receptivity to antistatic film.