The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Jul. 29, 2016
Kla-tencor Corporation, Milpitas, CA (US);
Ilya Bezel, Mountain View, CA (US);
Kenneth P. Gross, San Carlos, CA (US);
Lauren Wilson, San Jose, CA (US);
Rahul Yadav, Sunnyvale, CA (US);
Joshua Wittenberg, Fremont, CA (US);
Aizaz Bhuiyan, Milpitas, CA (US);
Anatoly Shchemelinin, Bozeman, MT (US);
Anant Chimmalgi, San Jose, CA (US);
Richard Solarz, Danville, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.