The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Dec. 13, 2013
Applicant:
Toray Industries, Inc., Tokyo, JP;
Inventors:
Assignee:
TORAY INDUSTRIES, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 7/12 (2006.01); G03F 7/038 (2006.01); C09D 179/08 (2006.01); G03F 7/037 (2006.01); C08G 73/10 (2006.01); G03F 7/004 (2006.01); G03F 7/023 (2006.01); G03F 7/40 (2006.01); H01L 27/32 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0387 (2013.01); C08G 73/1039 (2013.01); C09D 7/12 (2013.01); C09D 179/08 (2013.01); G03F 7/0046 (2013.01); G03F 7/0233 (2013.01); G03F 7/037 (2013.01); G03F 7/40 (2013.01); H01L 27/3258 (2013.01); H01L 51/529 (2013.01);
Abstract
The present invention provides a photosensitive resin composition which uses a polyimide precursor that has excellent solubility in organic solvents and is capable of reducing the viscosity of a resin composition obtained therefrom. The solution according to the present invention is a photosensitive resin composition which contains: an aromatic amide resin that has, as a main repeating unit, a specific structure having an amide group, a trifluoromethyl group and an aromatic ring; (b) a sensitizer; and (c) a solvent.