The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Aug. 28, 2014
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Masatoshi Echigo, Kanagawa, JP;
Dai Oguro, Kanagawa, JP;
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/022 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C07C 39/12 (2006.01); C07C 39/17 (2006.01); C07C 39/42 (2006.01); C07C 45/49 (2006.01); C07C 37/20 (2006.01); C07C 65/105 (2006.01); C07C 69/736 (2006.01); C07C 59/70 (2006.01); C07D 307/33 (2006.01); C08G 8/04 (2006.01); C08G 8/08 (2006.01); C08G 8/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 37/20 (2013.01); C07C 39/12 (2013.01); C07C 39/17 (2013.01); C07C 39/42 (2013.01); C07C 45/49 (2013.01); C07C 59/70 (2013.01); C07C 65/105 (2013.01); C07C 69/736 (2013.01); C07D 307/33 (2013.01); C08G 8/04 (2013.01); C08G 8/08 (2013.01); C08G 8/20 (2013.01); G03F 7/022 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); C07C 2601/14 (2017.05); C07C 2603/74 (2017.05); C07C 2603/92 (2017.05); Y10S 430/106 (2013.01); Y10S 430/108 (2013.01); Y10S 430/109 (2013.01);
Abstract
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.