The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Jun. 08, 2017
Jeol Ltd., Tokyo, JP;
Shigeyuki Morishita, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system () is equipped with an aberration corrector () for correcting aberrations in the optical system, and includes: an aberration measuring section () for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section () for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller () for controlling the aberration corrector () to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.