The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Sep. 29, 2016
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Yim-Bun Patrick Kwan, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 26/08 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); G02B 26/0825 (2013.01); G02B 27/0068 (2013.01); G03F 7/70266 (2013.01); G03F 7/70825 (2013.01);
Abstract
Optical modules used in exposure processes, in particular to optical modules of microlithography systems, are disclosed. Methods for deforming an optical element of an optical module as well as to optical imaging arrangements, optical imaging of methods and a method of manufacturing an optical element, are also disclosed. The disclosed technology may be used in the context of photolithography processes for fabricating microelectronic devices, in particular semiconductor devices, or in the context of fabricating devices, such as masks or reticles, used during such photolithography processes.