The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2018

Filed:

Sep. 30, 2011
Applicants:

Nyi O. Myo, San Jose, CA (US);

John S. Webb, Sunnyvale, CA (US);

Masato Ishii, Sunnyvale, CA (US);

Xuebin LI, Santa Clara, CA (US);

Zhiyuan YE, San Jose, CA (US);

Ali Zojaji, Santa Clara, CA (US);

Inventors:

Nyi O. Myo, San Jose, CA (US);

John S. Webb, Sunnyvale, CA (US);

Masato Ishii, Sunnyvale, CA (US);

Xuebin Li, Santa Clara, CA (US);

Zhiyuan Ye, San Jose, CA (US);

Ali Zojaji, Santa Clara, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); H01L 21/687 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45591 (2013.01); C23C 16/4584 (2013.01); C23C 16/4585 (2013.01); C23C 16/45502 (2013.01); H01L 21/687 (2013.01); H01L 21/68792 (2013.01); H01L 21/67386 (2013.01);
Abstract

Embodiments of the present invention generally relates to apparatus for use in film depositions. The apparatus generally include pre-heat rings adapted to be positioned in a processing chamber. In one embodiment, a pre-heat ring includes a ring having an inner edge and an outer edge. The outer edge has a constant radius. The inner edge is oblong-shaped and may have a first portion having a constant radius measured from a center of a circle defined by an outer circumference of the ring. A second portion may have a constant radius measured from a location other than the center of the outer circumference. In another embodiment, a processing chamber includes a pre-heat ring positioned around the periphery of a substrate support. The pre-heat ring includes an inner edge having a first portion, a second portion, and one or more linear portions positioned between the first portion and the second portion.


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